Abstract
To make thin film we use sputtering system. A simple sputtering system consist of a vacuum chamber with a target and a subtrate. A conventional diode sputtering system has numerous limitations. Therefore, the ionization efficiencies are low and self discharge cannot be maintained below a certain pressure. In view of these limitations, magnetron sputtering system have been developed. Such arranged magnetic field can confine the electron motion to the vicinity of the cathode and thereby increase the ionization efficiency. To make a very high sputtering rate that make more ionization efficiency, the OTS method was designed. We'll see how OTS can make more efficient.
(Indra Andriana 10205034 , kelas jumat siang)
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